Autori: Cheung WY
| Naslov | On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering (Article) |
| Autori | Jelenkovic Emil V Jevtic Milan M Tong KY Pang GKH Cheung WY Jha Shrawan K |
| Info | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, (2007), vol. 10 br. 4-5, str. 143-149 |
| Ispravka | Web of Science Članak Elečas Rang časopisa Citati: Web of Science |
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